The Imprio™ 100 represents the next generation in nano-lithography. This advanced tool is based on the unique Step and Flash Imprint Lithography technology called S-FIL™.

The Imprio 100 delivers high-resolution, sub-micron alignment, and 3-dimensional replication, to customers seeking cost-effective sub-50nm lithography. This tool was built to semiconductor standards around a core platform, using the latest technology for a production lithography system. Designed to grow to full factory automation, this tool contains a better than ISO Class 1 mini-environment, a high performance wafer stage, and a semi-automatic wafer and template loader.