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Imprio 50 Lithography System
sponsored by Molecular Imprints, Inc.
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Posted:
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30 Jan 2004
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Published:
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01 Dec 2003
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Format:
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PDF
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Length:
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2
Page(s)
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Type:
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Product Literature
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Language:
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English
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ABSTRACT:
The Imprio™ 50 is an entry level tool based on the unique Step and Flash Imprint Lithography technology called S-FIL™. The Imprio 50 delivers high resolution capability and 3-dimensional replication to customers seeking a low cost, sub-50nm lithography tool. The Imprio 50 is the perfect "e-beam" amplifier. E-beam systems can now be used as pattern generators to create imprint templates, which inturn, enable researchers to replicate critical experimental structures in minutes, with S-FIL, rather than in days with e-beam lithography.
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BROWSE RELATED
RESOURCES
Industrial Equipment | Manufacturing Systems | Semiconductors
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View All Resources
sponsored by Molecular Imprints, Inc.
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BROWSE RELATED PRODUCTS:
Hardware
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